Date | Time | Location (Shanghai International Convention Center) |
1F, Lobby | 3F, International Hall | 3F, Yellow River Hall | 5F, Yangtze River Hall | 7F, Pearl Hall |
August 21 | 08.30-12.00 | Onsite Registration | | | | |
13.00-14.00 | Training Lunch (Seagull Palace) |
14.00-15.35 | | | | MOCVD Short Course I |
15.35-15.50 | Coffee Break (7F, Public Area) |
15.50-18.00 | | | | MOCVD Short Course I |
18.00-19.30 | Training Dinner (Seagull Palace) |
August 22 | 09.00-10.00 | | | | MOCVD Short Course II |
10.00-10.30 | Coffee Break (7F, Public Area) |
10.30-12.00 | | | | MOCVD Short Course II |
12.00-13.00 | Training Lunch (Seagull Palace) |
14.00-18.00 | Poster Attach (3F, Public Area) |
14.00-18.00 | | The 2nd New Technologies, Equipment, Products and Materials Release | | |
19.00-20.00 | Reception Banquet (Seagull Palace) |
August 23 | 08.30-09.00 | Opening Ceremony | | | |
09.00-10.20 | Plenary | | | |
10.20-10.45 | Coffee Break (3F, Public Area) |
10.45-12.00 | | Plenary | | | |
12.00-13.00 | Lunch (Seagull Palace) |
13.30-15.00 | | | Epitaxy & Chip Session I | Packaging Session | Application Session I |
15.00-15.30 | Coffee Break (3F, 5F,7F, Public Areas) |
15.30-18.00 | | | Epitaxy & Chip Session I | Packaging Session | Application Session I |
18.00-19.30 | Dinner (Seagull Palace) |
20.00-21.00 | Huangpu River Sightseeing |
August 24 | 08.30-10.00 | | | Epitaxy & Chip Session II | Equipment & Measurement Session | Application Session II |
10.00-10.30 | Coffee Break (3F Public Area) |
10.30-12.00 | | | Epitaxy & Chip Session II | Equipment & Measurement Session | Application Session II |
12.00-13.00 | Lunch (Seagull Palace) |
13.30-15.00 | | | Cooperation & Competition Dialogue | | |
15.00-15.30 | Coffee Break (3F, Public Area) |
15.00-17.00 | Poster Communication (3F, Public Area) |
15.30-17.00 | | | Cooperation & Competition Dialogue | | |
17.00-17.30 | | | Closing Ceremony | | |
18.00-19.30 | Closing Banquet (Seagull Palace) |
